← Leaderboards
Jorge J Rocca
Colorado State University
$9,479,411
Attributed
$41,529,086
Total exposure
15
Grants
15
Lead (contact PI)
Attributed= this PI's even-split share of every grant they're on (the fair, additive number). Exposure = full size of all those grants.
Funding over time
peak $2.1M · FY2005–25$2.5M$1.9M$1.3M$625K$0
'05
'06
'07
'08
'09
'10
'11
'12
'13
'14
'15
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'20
'21
'22
'23
'24
'25
Funding mix
By agency
NSF$41,529,086 · 15
By mechanism
—$41,529,086 · 15
Top collaborators
- Margaret M Murnane5 shared
- Carmen S Menoni3 shared
- Mario C Marconi3 shared
- Stephen R Leone3 shared
- David Attwood2 shared
- Henry C Kapteyn2 shared
- Kaarin K Goncz2 shared
- Vyacheslav Shlyaptsev2 shared
Grant awards (15)
REU Site: Ultraintense Lasers and High Field Photonics$458,656
· FY2025 · ENG · contact PI
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits$250,000
· FY2022 · TIP · contact PI
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light$371,315
· FY2019 · ENG · contact PI
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits$199,889
· FY2017 · TIP · contact PI
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices$413,500
· FY2015 · ENG · contact PI
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light$335,572
· FY2015 · ENG · contact PI
NSF EUV ERC RET in Engineering & Computer Science Site Program$328,681
· FY2014 · ENG · contact PI
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength$422,000
· FY2013 · TIP · contact PI
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light$286,950
· FY2012 · ENG · contact PI
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale$1,500,000
· FY2010 · ENG · contact PI
High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges$591,000
· FY2010 · MPS · contact PI
RET-Site Program in Light & Optics for the NSF EUV ERC$333,347
· FY2008 · ENG · contact PI
MRI: Development of the Next Generation of Compact Coherent Extreme Ultraviolet Sources$900,000
· FY2005 · ENG · contact PI
Engineering Research Center for Extreme Ultraviolet Science and Technology$35,132,176
· FY2003 · ENG · contact PI
Student and Young Scientist Participation in the 8th International Conference on X-Ray Lasers to be held in Aspen, Colorado$6,000
· FY2002 · ENG · contact PI