UOFA WILL DESIGN PIAACMC SYSTEM FOR THE PROPOSED EFFORT WORKING CLOSELY WITH THE PI AND HIS TEAM. UOFA WILL LEAD THE FOCAL PLANE MASK DESIGN ACTIVITY MATCHING MANUFACTURING REQUIREMENTS WITH DESIGN OPTIMIZATION. UOFA WILL WORK CLOSELY WITH THE MICRO-DEVICES LABORATORY (JPL) AS WELL AS OTHER UNIVERSITY-BASED LITHOGRAPHY FACILITY TO INVESTIGATE AND EVALUATE FOCAL PLANE MASK DESIGN AND MANUFACTURING STRATEGIES THAT MEET THE HIGH CONTRAST REQUIREMENTS. TO COMPLEMENT MDL'S YEARLY FOCAL PLANE MASK DESIGN/MANUFACTURING/DELIVERY CYCLE UOFA WILL MANAGE MORE FREQUENT DESIGN CYCLE AIMED AT EXPLORING DESIGN/MANUFACTURING TRADEOFFS AND RAPIDLY DEVELOPING A RELIABLE UNDERSTANDING OF THE FOCAL PLANE MASK REQUIREMENTS FOR IT INTENDED END USE.