NEXT-GENERATION EUV MULTILAYER COATINGS FOR SOLAR IMAGING AND SPECTROSCOPYWE PLAN TO DEVELOP NEW EUV MULTILAYER COATINGS THAT PROVIDE HIGHER NORMAL-INCIDENCE REFLECTANCE BETTER CONTROL OF SPECTRAL BANDPASS (USING APERIODIC COATING DESIGNS) FOR IMPROVED NARROW-BAND IMAGING AND WIDE-BAND SPECTROSCOPY BETTER STABILITY AND RESISTANCE TO OXIDATION AND HARSH ENVIRONMENTS (FOR USE IN MISSIONS THAT HAVE ORBITS SUBJECTED TO A HIGH FLUX OF ENERGETIC PARTICLES FOR EXAMPLE) AND LOWER FILM STRESS TO AVOID POTENTIAL COATING FAILURES. THESE ADVANCEMENTS IN COATING PERFORMANCE WILL BE ACHIEVED THROUGH A COMPREHENSIVE EXPERIMENTAL RESEARCH PROGRAM DURING WHICH WE WILL TEST A VARIETY OF NEW MULTILAYER MATERIAL COMBINATIONS AND OPTIMIZE PERFORMANCE OF THE BEST COATINGS BY SYSTEMATICALLY ADJUSTING THE MULTILAYER DESIGN. WE WILL CHARACTERIZE THE EUV REFLECTANCE FILM STRESS AND STABILITY OF THE NEW COATINGS WE DEVELOP IN ORDER TO RAISE THEIR TECHNOLOGY READINESS LEVEL (TO TRL 4 OR 5) AND THUS QUALIFY THEIR USE IN FUTURE NASA MISSIONS.