MRI Acquisition: Compound Semiconductor Reactive Ion Etcher for Functionally Diverse Materials, Structures and Devices

University Of Texas At Dallas, Richardson TX

Investigators

Abstract

The objective of this research is to enhance fabrication of devices based on compound semiconductors in areas related to energy, nanoelectronics and nanophotonics. The approach is to acquire one inductively coupled plasma (ICP) reactive ion etcher (RIE) for etching compound semiconductors and materials on compound semiconductors to augment the tool set available within the shared-access University of Texas at Dallas (UTD) shared-access Cleanroom Research Laboratory (CRL). Intellectual Merit: The project will close the gap in compound semiconductor applications, unify research and development in materials and devices, and allow teaming among university and industry researchers for a wide variety of application segments including communications, military, medical and energy. Broader Impact: The UTD CRL enables the research of over 160 users throughout UTD as well as academic researchers from other universities. Hands-on experience with state-of-the-art equipment prepares students and post-docs to enter the workforce ready to engage in research, development, and manufacturing. The breadth of functionally diverse materials, structures and devices enabled by this RIE will attract a broader pool of researchers beyond the current user base. The PIs will develop a two lecture sequence for an undergraduate Nanotech Instrumentation course which will focus on facilitization of advanced research equipment using this new RIE as the example. This represents a unique opportunity to directly show undergraduates how numerous disciplines are required to manufacture, install and operate advanced research equipment.