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DEVELOPMENT OF A PLASMA-ENHANCED ULTRA-HIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION SYSTEM FOR NOVEL SN BASED GROUP-IV OPTOELECTRONIC DEVICES

$52,000FY2010Department of the ArmyDOD

University Of Arkansas, Fayetteville AR

Investigators

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DEVELOPMENT OF A PLASMA-ENHANCED ULTRA-HIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION SYSTEM FOR NOVEL SN BASED GROUP-IV OPTOELECTRONIC DEVICES · GrantIndex