SBIR Phase I: Hybrid holographic lithography for cost-effective fabrication of nanostructures

Electrooptic Technologies And Application Systems, San Diego CA

Investigators

Abstract

This Small Business Innovation Research Phase I project is to demonstrate a novel nanolithography process, i.e. Hybrid Holographic Lithography (HHL) combining interferometric optical lithography with a Spatial Light Modulator (SLM) imaging technique to enable maskless pattern generation. If successful, the new lithographic method will provide a cost effective means of generating nanostructures that can be applied in many fields.