SBIR Phase I: Dual-Wavelength Diffractive Optics for Absorbance-Modulation Optical Lithography

Lumarray Llc, Somerville MA

Investigators

Abstract

This Small Business Innovation Research Phase I project is to design dual wavelength diffractive optics for maskless absorbance modulation optical lithography. Absorbance-modulation optical lithography (AMOL) can achieve nanoscale resolution, while getting rid of the expensive photomask. Successful development of a maskless absorbance modulation optical lithograpy system will provide nanoscale resolution at lower costs than scanning electron beam lithography. This technology provides a combination of resolution and writing speed that is currently unavailable, and hence, will create a paradigm shift in the field of nanomanufacturing.