SBIR Phase II: Trapping Particle Detector for On-Line Monitoring

Verionix, North Andover MA

Investigators

Abstract

This Small Business Innovation Research (SBIR) Phase II project will develop improved particle detectors for monitoring of semiconductor manufacturing tools. This detection technology will increase count rates for greater than 0.2 micron diameter particles by 100 to 1000 times improving correlations between the particle detector and wafer by greater than 10 times. For smaller particles this detector will enable detection, ultimately to the nanoparticle regime (less than 25 nanometers). The intellectual merit of this proposal is that it will advance the state of knowledge in the field of engineering and physics of microplasmas. It will broaden knowledge of plasma scaling and of the behavior of particles in plasmas. The project will involve the following tasks: Optical detector hardware development ; Trap development for capturing particles; Data analysis, Control system and Software interface development and ; Field testing of prototypes. This project will provide currently unavailable detection technology for monitoring particles. Commercially, this project will improve the performance of semiconductor process tool manufacturer's products by enabling cost-effective, real-time monitoring. The broad economic benefit of this program will be to enhance the competitiveness of domestic semiconductor manufacturers where particle issues account for approximately 11% of manufacturing tool down time and are a major cause of scrap and yield losses. For the future nanotechnology industry as a whole this detector will enhance workplace and public safety by enabling monitoring of nanoparticle levels and production processes.