49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication; Orlando, Florida

Massachusetts Institute Of Technology, Cambridge MA

Investigators

Abstract

This award provides support to graduate students to attend the 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2005, to be held in Orlando, Florida, May 31 to June 3, 2005. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent. The requested travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange ideas and information at conferences, and they'll hear first-hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the students how the conference program is put together.