NER: A Process for Plasma Co-Deposition of Nanoparticles for Mixed-Phase Thin Films

University Of Minnesota-Twin Cities, Minneapolis MN

Investigators

Abstract

The objective of this research is the synthesis and characterization of novel mixed-phase materials consisting of semiconductor nanocrystallites embedded within a thin film semiconductor or insulator. The approach is to use a new co-deposition system to create nanoparticles in a plasma chamber that are rapidly injected into a second plasma deposition system where they are incorporated into a growing thin film material. Separating the particle growth from the thin film deposition enables the particle beam density, particle size, and the film deposition rate to be independently controlled. Cross-sectional Transmission Electron Microscopy measurements will provide important information on the size and density of the nanocrystalline inclusions. The bulk properties of the resulting films will be characterized through measurements of the conductance; optical absorption spectrum and the infra-red absorption spectrum providing important information concerning the defect density and hydrogen microstructure. This basic research into the fabrication of novel materials has considerable potential for the development of a wide variety of devices incorporating nanoscale inclusions and for the modification of optical properties of dielectric or polymer films. Possible practical applications include improved solar cells, non-volatile memories and solid-state lighting. Successful completion of this project may lead to rapid commercialization of new manufacturing processes through collaboration with a private company vested in solid-state lighting, that has the potential to replace less efficient fluorescent and incandescent lamps.