NER: Solvent Assisted Atomic Layer Deposition

North Carolina State University, Raleigh NC

Investigators

Abstract

Future nano-scale electronic device technologies (including advanced molecular, biological, and magnetic devices) will utilize a much wider range of materials than found in current devices. Advanced devices will also require exquisite control over bond structure at interfaces between dissimilar materials, placing stringent demands on processes and processing conditions. There is growing interest in atomic layer deposition (ALD) techniques that enable atomic-level control over depositing thin films, to achieve highly conformal and smooth deposition of materials of interest in a variety of nano-scale and nano-electronic devices. For this project, we propose to demonstrate the use of solvation energy as a new possible reaction .driver. in an atomic layer deposition process. This concept will be demonstrated using a supercritical solvent (specifically CO2) to facilitate reduction of a metal-organic precursor adsorbed on a deposition surface. The particular demonstration chosen for this one-year effort does not constitute a completely integrated or scalable deposition process. Rather, the demonstration is designed to show feasibility of implementing and utilizing solvation force effects to achieve atomic level control in deposition of atomically smooth, nano-scale conformal electronic thin films. A successful demonstration will prompt more expanded work required to achieve more mature and hardware- intensive deposition tools and methods that are outside the scope of this short exploratory project. This work most closely addresses the theme of Manufacturing Processes at the Nanoscale. It specifically addresses issues related to .novel tools.for manufacturing at the nanoscale, developing novel concepts for high-rate synthesis and processing of nanostructures,.and scaleup of nanoscale synthesis and processing methods.. The project will take advantage of, and build upon, the PI.s experience in fundamental studies and practical demonstration of thin film deposition processes. A new integrated vacuum deposition/characterization system with a wide range of surface characterization tools, including surface electron spectroscopy and infrared absorption spectroscopy, is available in the PI.s lab, and will be used to demonstrate and understand the particular detailed mechanisms associated with the proposed process. This work will have broader impacts beyond the particular research results. In addition to the education benefit received by the graduate student and post-doc that will work on this project, the PI will use this effort to help expand his graduate/undergraduate Chemical Engineering course .Chemical Processing of Electronic Materials. to include discussion of possible applications of solvent-based processes in nano-scale materials and device fabrication. An exploratory undergraduate lab will also be developed that to supplement the course material.