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GOALI: Rational Design of Advanced Photoresist Materials for 193 nm and 157 nm Lithography

$295,786FY2003MPSNSF

Georgia Tech Research Corporation, Atlanta GA

Investigators

Clifford L HendersoncontactPeter J LudoviceRobert A Shick

Abstract

TO BE ENTERED LATER.

View original record on NSF Award Search →
GOALI: Rational Design of Advanced Photoresist Materials for 193 nm and 157 nm Lithography · GrantIndex