STTR Phase II: Nanostructure Fabrication Using Near-Field Scanning Optical Microscopy

Itn Energy Systems, Inc., Littleton CO

Investigators

Abstract

This Small Business Technology Transfer (STTR) Phase II project will further develop a revolutionary approach to nanostructure fabrication. This Near-Field Scanning Optical Nanolithographic approach, which we have already shown to be capable of writing 100nm width lines, utilizes a direct, optical write technology in conjunction with optical photoresists. The direct optical writing is performed with a customized Near-Field Scanning Optical Microscope (NSOM) tool. The major goal of the proposed work is to design and construct a commercially viable NSOM lithography tool and demonstrate processes for flexible pattern generation on 4" wafers. Phase I work demonstrated the preliminary design of the NSOM lithography tool and photoresist processes using a novel inorganic hydrogenated amorphous silicon resist, as well as conventional polymer resists. Best line widths of approximately 100nm, comparable to the probe diameter, were obtained. The commercial benefits from this project will be the construction and demonstration of the NSOM lithography tool for rapid prototyping of nanostructures in university and corporate research labs.