A Rapid Prototyping Approach to Semiconductor Device Manufacturing Process Simulation

University Of Maryland, College Park, College Park MD

Investigators

Abstract

0082381 Adomaitis We propose to develop the computational framework that will make possible a rapid proto-typing approach to simulator development for microelectronic device fabrication process systems. This research is intended to fill the gap that exists between supercomputer-based, highly resolved simulations and lumped-parameter models, a range currently spanned by specialized methods for process simulation, analysis, model reduction, and parameter estimation - numerical tools that are generally incompatible with each other. The proposed approach to process simulation is based on developing computational elements that have a one-to-one correspondence to the steps taken when implementing high-dimensional projection, spectral filtering and advanced weighted residual methods, such as the reduced basis and nonlinear Galerkin projections. Methods for assessing model validity; solution analysis (e.g., stability), and discretization error will be addressed in this framework. Indeed, because of its reliance on parameter estimation methods, an absolute measure of reduced-model predictive power always will be produced in this simulation framework. These interconnected computational tools will be developed in the MATLAB environment, taking advantage of MATLAB's object-oriented programming features to simplify simulations of complex systems and to create a pathway to incorporating our simulation tools in spectral element and other commercial software packages. The need to generate computationally efficient, validated simulations for improving across-wafer processing uniformity in chemical vapor deposition and other semiconductor materials manufacturing unit operations provides the primary motivation for this research. Reduced models are suitable for real-time and run-to-run control, efficient process recipe optimization, and model-based sensing and estimation of unmeasurable processes, such as microfeature evolution. This proposal will support the joint research between the PI and the Tecbnology CAD group of Intel through a graduate student internship aimed at testing the simulation tools in a corporate research environment. The basic elements of this approach also will be developed in the context of a commercial chemical vapor deposition (CVD) cluster tool located at the University of Maryland, with the goal of producing a validated, reduced model to be used for wafer temperature prediction and conformal CVD studies. ***